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Visible to near-infrared broadband photodetector employing thin film topological insulator heterojunction (p-TlBiSe2/n-Si) diode

  • Gyanendra Kumar Maurya
  • , Vidushi Gautam
  • , Faizan Ahmad
  • , Roshani Singh
  • , Kavindra Kandpal
  • , Rachana Kumar
  • , Mahesh Kumar
  • , Pramod Kumar
  • , Akhilesh Tiwari
  • Indian Institute of Information Technology, Allahabad
  • Jawaharlal Nehru Technological University Hyderabad
  • CSIR - National Physical Laboratory

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The work presents a study of quasi-2D thin topological insulator film of TlBiSe2 and its heterojunction TlBiSe2/Glass and TlBiSe2/Si by thermal coating. The vibrational modes were identified in both the heterojunctions using Raman spectroscopy with the identification of the surface phonon mode (SPM) in the TlBiSe2/Si heterojunction. Ultrafast dynamics were studied for the relaxation dynamics of the charge carriers in these heterojunctions. The study identified the interface phenomenon in the form of charge states (CT) in TlBiSe2/Si p-n heterojunction. The p-TlBiSe2/n-Si heterojunction showed good p-n diode characteristics with a rectification ratio under the dark. Its optical response was studied by varying optical power (2.37–3.78 µW) and wavelength (500–1900 nm). It showed excellent photoresponse in the visible to near-infrared (NIR) range which peaks at 900 nm wavelength in both forward as well reverse bias. The explanation of its optical and electrical performance was modeled in terms of band structure, surface states, and interface phenomenon. The study is important in terms of the implementation of next-generation topological insulator-based photodetectors.

Original languageEnglish
Article number155813
JournalApplied Surface Science
Volume612
DOIs
StatePublished - 1 Mar 2023
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2022 Elsevier B.V.

Funding

The authors would like to thank CSTUP and DST, Govt. of India for providing the financial support to carry out this work. VLSI Lab, Department of Electronics and communications, IIIT Allahabad for electrical characterization. Contributions. G.K.M. and P.K. conceived the initial research idea and planned the study. G.K. V. G. did the electrical analysis. R.K and P.K. did the Raman and transient absorption analysis. G.K.M. F.A. K.K. P.K. A.T. and R.K. wrote the manuscript. M.K. recorded the ultra-fast transient absorption data. P.K. and A.T. supervised the work.

Funders
CSTUP
Department of Science and Technology, Ministry of Science and Technology, India

    Keywords

    • Heterojunction
    • Interface state density
    • Interface trap
    • Photodetector
    • Topological insulators (TI) thin film
    • Ultrafast transient absorption spectroscopy

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