Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos; K. Xu; M. Lux; W. Fyen; R. Singh; Z. Chen; P. Mertens; Z. Hatcher; M. Heyns

doi:10.4028/www.scientific.net/ssp.76-77.263

Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos
, K. Xu
, M. Lux
, W. Fyen
, R. Singh
, Z. Chen
, P. Mertens
, Z. Hatcher
, M. Heyns

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

Original language	English
Title of host publication	Ultra Clean Processing of Silicon Surfaces 2000
Editors	Marc Heyns, Paul Mertens, Marc Meuris
Publisher	Trans Tech Publications Ltd
Pages	263-266
Number of pages	4
ISBN (Print)	9783908450573
DOIs	https://doi.org/10.4028/www.scientific.net/ssp.76-77.263
State	Published - 2001
Externally published	Yes
Event	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium Duration: 18 Sep 2000 → 20 Sep 2000

Publication series

Name	Solid State Phenomena
Volume	76-77
ISSN (Print)	1012-0394
ISSN (Electronic)	1662-9779

Conference

Conference	5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
Country/Territory	Belgium
City	Ostend
Period	18/09/00 → 20/09/00

Bibliographical note

Publisher Copyright:
© (2001) Trans Tech Publications, Switzerland.

Keywords

Hydrophobic interactions
Particle removal efficiency
Surface charge

Access to Document

10.4028/www.scientific.net/ssp.76-77.263

Cite this

Vos, R., Xu, K., Lux, M., Fyen, W., Singh, R., Chen, Z., Mertens, P., Hatcher, Z., & Heyns, M. (2001). Use of surfactants for improved particle performance of dHF-based cleaning recipes. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 263-266). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/ssp.76-77.263

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title = "Use of surfactants for improved particle performance of dHF-based cleaning recipes",

abstract = "A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.",

keywords = "Hydrophobic interactions, Particle removal efficiency, Surface charge",

author = "R. Vos and K. Xu and M. Lux and W. Fyen and R. Singh and Z. Chen and P. Mertens and Z. Hatcher and M. Heyns",

note = "Publisher Copyright: {\textcopyright} (2001) Trans Tech Publications, Switzerland.; 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 ; Conference date: 18-09-2000 Through 20-09-2000",

year = "2001",

doi = "10.4028/www.scientific.net/ssp.76-77.263",

language = "אנגלית",

isbn = "9783908450573",

series = "Solid State Phenomena",

publisher = "Trans Tech Publications Ltd",

pages = "263--266",

editor = "Marc Heyns and Paul Mertens and Marc Meuris",

booktitle = "Ultra Clean Processing of Silicon Surfaces 2000",

}

Vos, R, Xu, K, Lux, M, Fyen, W, Singh, R, Chen, Z, Mertens, P, Hatcher, Z & Heyns, M 2001, Use of surfactants for improved particle performance of dHF-based cleaning recipes. in M Heyns, P Mertens & M Meuris (eds), Ultra Clean Processing of Silicon Surfaces 2000. Solid State Phenomena, vol. 76-77, Trans Tech Publications Ltd, pp. 263-266, 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000, Ostend, Belgium, 18/09/00. https://doi.org/10.4028/www.scientific.net/ssp.76-77.263

Use of surfactants for improved particle performance of dHF-based cleaning recipes. / Vos, R.; Xu, K.; Lux, M. et al.
Ultra Clean Processing of Silicon Surfaces 2000. ed. / Marc Heyns; Paul Mertens; Marc Meuris. Trans Tech Publications Ltd, 2001. p. 263-266 (Solid State Phenomena; Vol. 76-77).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Vos, R.

AU - Xu, K.

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AU - Fyen, W.

AU - Singh, R.

AU - Chen, Z.

AU - Mertens, P.

AU - Hatcher, Z.

AU - Heyns, M.

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PY - 2001

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N2 - A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

AB - A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

KW - Hydrophobic interactions

KW - Particle removal efficiency

KW - Surface charge

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BT - Ultra Clean Processing of Silicon Surfaces 2000

A2 - Heyns, Marc

A2 - Mertens, Paul

A2 - Meuris, Marc

PB - Trans Tech Publications Ltd

T2 - 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000

Y2 - 18 September 2000 through 20 September 2000

ER -

Use of surfactants for improved particle performance of dHF-based cleaning recipes

Abstract

Publication series

Conference

Bibliographical note

Keywords

Access to Document

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Cite this