Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos; K. Xu; M. Lux; W. Fyen; R. Singh; Z. Chen; P. Mertens; Z. Hatcher; M. Heyns

Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos
, K. Xu
, M. Lux
, W. Fyen
, R. Singh
, Z. Chen
, P. Mertens
, Z. Hatcher
, M. Heyns

Interuniversitair Micro-Elektronica Centrum
University of Florida
Ashland Inc

Research output: Contribution to journal › Conference article › peer-review

7 Scopus citations

Abstract

A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

Original language	English
Pages (from-to)	263-266
Number of pages	4
Journal	Diffusion and Defect Data Pt.B: Solid State Phenomena
Volume	76-77
State	Published - 2000
Externally published	Yes
Event	5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: 18 Sep 2000 → 20 Sep 2000

Cite this

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title = "Use of surfactants for improved particle performance of dHF-based cleaning recipes",

abstract = "A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.",

author = "R. Vos and K. Xu and M. Lux and W. Fyen and R. Singh and Z. Chen and P. Mertens and Z. Hatcher and M. Heyns",

year = "2000",

language = "אנגלית",

volume = "76-77",

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journal = "Diffusion and Defect Data Pt.B: Solid State Phenomena",

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note = "5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) ; Conference date: 18-09-2000 Through 20-09-2000",

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T1 - Use of surfactants for improved particle performance of dHF-based cleaning recipes

AU - Vos, R.

AU - Xu, K.

AU - Lux, M.

AU - Fyen, W.

AU - Singh, R.

AU - Chen, Z.

AU - Mertens, P.

AU - Hatcher, Z.

AU - Heyns, M.

PY - 2000

Y1 - 2000

N2 - A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

AB - A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

UR - https://www.scopus.com/pages/publications/0034507059

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.conferencearticle???

AN - SCOPUS:0034507059

SN - 0377-6883

VL - 76-77

SP - 263

EP - 266

JO - Diffusion and Defect Data Pt.B: Solid State Phenomena

JF - Diffusion and Defect Data Pt.B: Solid State Phenomena

T2 - 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000)

Y2 - 18 September 2000 through 20 September 2000

ER -

Use of surfactants for improved particle performance of dHF-based cleaning recipes

Abstract

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