Abstract
A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.
Original language | English |
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Pages (from-to) | 263-266 |
Number of pages | 4 |
Journal | Diffusion and Defect Data Pt.B: Solid State Phenomena |
Volume | 76-77 |
State | Published - 2000 |
Externally published | Yes |
Event | 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: 18 Sep 2000 → 20 Sep 2000 |