Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos, K. Xu, M. Lux, W. Fyen, R. Singh, Z. Chen, P. Mertens, Z. Hatcher, M. Heyns

Research output: Contribution to journalConference articlepeer-review

7 Scopus citations

Abstract

A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

Original languageEnglish
Pages (from-to)263-266
Number of pages4
JournalDiffusion and Defect Data Pt.B: Solid State Phenomena
Volume76-77
StatePublished - 2000
Externally publishedYes
Event5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium
Duration: 18 Sep 200020 Sep 2000

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