Abstract
A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.
Original language | English |
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Title of host publication | Ultra Clean Processing of Silicon Surfaces 2000 |
Editors | Marc Heyns, Paul Mertens, Marc Meuris |
Publisher | Trans Tech Publications Ltd |
Pages | 263-266 |
Number of pages | 4 |
ISBN (Print) | 9783908450573 |
DOIs | |
State | Published - 2001 |
Externally published | Yes |
Event | 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium Duration: 18 Sep 2000 → 20 Sep 2000 |
Publication series
Name | Solid State Phenomena |
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Volume | 76-77 |
ISSN (Print) | 1012-0394 |
ISSN (Electronic) | 1662-9779 |
Conference
Conference | 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 |
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Country/Territory | Belgium |
City | Ostend |
Period | 18/09/00 → 20/09/00 |
Bibliographical note
Publisher Copyright:© (2001) Trans Tech Publications, Switzerland.
Keywords
- Hydrophobic interactions
- Particle removal efficiency
- Surface charge