Use of surfactants for improved particle performance of dHF-based cleaning recipes

R. Vos, K. Xu, M. Lux, W. Fyen, R. Singh, Z. Chen, P. Mertens, Z. Hatcher, M. Heyns

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.

Original languageEnglish
Title of host publicationUltra Clean Processing of Silicon Surfaces 2000
EditorsMarc Heyns, Paul Mertens, Marc Meuris
PublisherTrans Tech Publications Ltd
Pages263-266
Number of pages4
ISBN (Print)9783908450573
DOIs
StatePublished - 2001
Externally publishedYes
Event5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium
Duration: 18 Sep 200020 Sep 2000

Publication series

NameSolid State Phenomena
Volume76-77
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
Country/TerritoryBelgium
CityOstend
Period18/09/0020/09/00

Bibliographical note

Publisher Copyright:
© (2001) Trans Tech Publications, Switzerland.

Keywords

  • Hydrophobic interactions
  • Particle removal efficiency
  • Surface charge

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