Ultraviolet-assisted pulsed laser deposition of thin oxide films

V. Craciun, R. K. Singh

Research output: Contribution to journalArticlepeer-review

14 Scopus citations


The properties of thin Y2O3, ZnO, and Ba0.5Sr0.5TiO3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (UVPLD) technique have been studied. With respect to films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD grown films exhibited better structural, optical, and electrical properties, especially for lower substrate temperatures. These improvements can be explained by the combined action of several processes. First, high energy UV photons and ozone ensure a better in situ cleaning of the substrate prior to the deposition. Second, the presence of ozone and atomic oxygen formed by photodissociation of molecular O2 promotes the growth of more oxygenated films. Finally, absorption of UV photons by adatoms could result in an increase of their surface mobility. All these factors have a beneficial effect upon crystalline growth.

Original languageEnglish
Pages (from-to)239-243
Number of pages5
JournalApplied Surface Science
Issue number1-4
StatePublished - 15 Dec 2000
Externally publishedYes


Dive into the research topics of 'Ultraviolet-assisted pulsed laser deposition of thin oxide films'. Together they form a unique fingerprint.

Cite this