Ultraviolet-assisted pulsed laser deposition: A new technique for the growth of thin oxide films at medium and low temperatures

Keyphrases

• Low Temperature 100%
• Pulsed Laser Deposition 100%
• Thin Oxide Films 100%
• Medium Temperature 100%
• Ultraviolet-assisted 100%
• Ultraviolet Photon 66%
• In Situ 33%
• Stoichiometry 33%
• Crystallinity 33%
• Growth Process 33%
• Optical Properties 33%
• Oxygenation 33%
• Beneficial Effects 33%
• Ablation 33%
• Crystal Growth 33%
• Electrical Properties 33%
• UV Illumination 33%
• Thermal Energy 33%
• In-situ Cleaning 33%
• Substrate Temperature 33%
• Photodissociation 33%
• Low Substrate Temperature 33%
• Atomic Oxygen 33%
• Physisorbed 33%
• Adatoms 33%
• UV-assisted 33%
• Yttrium Oxide 33%
• UV-ozone 33%
• Gaseous Species 33%
• Energy Available 33%
• Ba0.5Sr0.5TiO3 33%
• Molecular O2 33%
• Surface Mobility 33%
• Deep Ultraviolet 33%

Material Science

• Pulsed Laser Deposition 100%
• Oxide Film 100%
• Film 80%
• ZnO 20%
• Optical Property 20%
• Crystal Growth 20%