Ultra-high Q silicon resonators in planarized LOCOS

Alex Naiman; Boris Desiatov; Liron Stern; Noa Mazurski; Joseph Shappir; Uriel Levy

doi:10.1364/cleo_si.2015.sth3g.3

Ultra-high Q silicon resonators in planarized LOCOS

Alex Naiman, Boris Desiatov, Liron Stern, Noa Mazurski, Joseph Shappir, Uriel Levy

Hebrew University of Jerusalem

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (6 5.3 10⁶) silicon resonators, with nearly fully planar interface for multilayer silicon integration.

Original language	English
Title of host publication	CLEO
Subtitle of host publication	Science and Innovations, CLEO-SI 2015
Publisher	Optical Society of America (OSA)
Pages	2267
Number of pages	1
ISBN (Electronic)	9781557529688
DOIs	https://doi.org/10.1364/cleo_si.2015.sth3g.3
State	Published - 4 May 2015
Externally published	Yes
Event	CLEO: Science and Innovations, CLEO-SI 2015 - San Jose, United States Duration: 10 May 2015 → 15 May 2015

Publication series

Name	CLEO: Science and Innovations, CLEO-SI 2015

Conference

Conference	CLEO: Science and Innovations, CLEO-SI 2015
Country/Territory	United States
City	San Jose
Period	10/05/15 → 15/05/15

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10.1364/cleo_si.2015.sth3g.3

Cite this

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title = "Ultra-high Q silicon resonators in planarized LOCOS",

abstract = "We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (6 5.3 106) silicon resonators, with nearly fully planar interface for multilayer silicon integration.",

author = "Alex Naiman and Boris Desiatov and Liron Stern and Noa Mazurski and Joseph Shappir and Uriel Levy",

year = "2015",

month = may,

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doi = "10.1364/cleo_si.2015.sth3g.3",

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Naiman, A, Desiatov, B, Stern, L, Mazurski, N, Shappir, J & Levy, U 2015, Ultra-high Q silicon resonators in planarized LOCOS. in CLEO: Science and Innovations, CLEO-SI 2015. CLEO: Science and Innovations, CLEO-SI 2015, Optical Society of America (OSA), pp. 2267, CLEO: Science and Innovations, CLEO-SI 2015, San Jose, United States, 10/05/15. https://doi.org/10.1364/cleo_si.2015.sth3g.3

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AU - Desiatov, Boris

AU - Stern, Liron

AU - Mazurski, Noa

AU - Shappir, Joseph

AU - Levy, Uriel

PY - 2015/5/4

Y1 - 2015/5/4

N2 - We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (6 5.3 106) silicon resonators, with nearly fully planar interface for multilayer silicon integration.

AB - We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (6 5.3 106) silicon resonators, with nearly fully planar interface for multilayer silicon integration.

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BT - CLEO

PB - Optical Society of America (OSA)

T2 - CLEO: Science and Innovations, CLEO-SI 2015

Y2 - 10 May 2015 through 15 May 2015

ER -

Ultra-high Q silicon resonators in planarized LOCOS

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