Original language | English |
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Title of host publication | Semiconductors and Semimetals |
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Publisher | Academic Press Inc. |
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Pages | 45-116 |
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Number of pages | 72 |
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Edition | C |
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DOIs | |
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State | Published - 1998 |
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Externally published | Yes |
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Name | Semiconductors and Semimetals |
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Number | C |
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Volume | 55 |
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ISSN (Print) | 0080-8784 |
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Funding Information:
First and foremost, this review would not have been possible without the help and stimulation of several generations of research students at Oxford. They have contributed substantially to the development of many of the ideas and techniques presented here, in particular D. G. Austing, J. M. Smith, U. M. Khan-Cheema, H. Im, W. Chaudhry, and G. Rau. I am grateful to Dr. J. M. Smith and Dr. U. M. Khan Cheema for assistance with the preparation of many of the diagrams. I am also very much indebted to Dr. M. I. Eremets, whose ingenuity, technical knowledge, and willing assistance have advanced the application of high-pressure methodology at Oxford, and to Prof. R. H. Friend, who first introduced me to the excitement of high-pressure research and, with J. Simmons, also provided technical assistance in the early stages. The author acknowledges financial support from the Engineering and Physical Sciences Research Council and the Royal Society of the UK, and the Human Capital and Mobility Network program of the EU, without which this chapter could not have been written.