Tunable nano devices fabricated by controlled deposition of gold nanoparticles via focused ion beam

Asaf Shahmoon, Ofer Limon, Olga Girshevitz, Yafit Fleger, Hilmi Volkan Demir, Zeev Zalevsky

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

In this paper, we present the fabrication procedures as well as the preliminary experimental results of a novel method for significantly simplified deposition of charged nanoparticles at specific patterns based on focused ion beam (FIB) technology. The deposition method relies on the implantation of positive gallium ions on an insulated material which creates the basis for attracting the nanoparticles to the substrate. In order to substantiate the theory two patterns were generated on a silicon on insulator (SOI) chip with an upper layer of silicon of 200 nm. The two patterns are as follows: resolution target - consisting of six squares and 400 nm × 400 nm circular sinusoidal tunnel. In addition, we demonstrate the utilization and applicability of the aforementioned method in a tunable radiation nano device as well as show its experimental characterization.

Original languageEnglish
Pages (from-to)1363-1366
Number of pages4
JournalMicroelectronic Engineering
Volume87
Issue number5-8
DOIs
StatePublished - May 2010

Keywords

  • Nanofabrication
  • Nanoparticle patterning
  • Particle attachment
  • Particle deposition

Fingerprint

Dive into the research topics of 'Tunable nano devices fabricated by controlled deposition of gold nanoparticles via focused ion beam'. Together they form a unique fingerprint.

Cite this