Transformation of silica fume into chemical mechanical polishing (CMP) nano-slurries for advanced semiconductor manufacturing
M. M. Rashad
, M. M. Hessien
, E. A. Abdel-Aal
, K. El-Barawy
, R. K. Singh
Central Metallurgical Research & Development Institute
University of Florida
Research output: Contribution to journal › Article › peer-review
31Scopus
citations
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