TY - JOUR
T1 - The role played by oxygen plasma on Teflon
T2 - Relevance to the concept of "cryptoelectrons"
AU - Piperno, Silvia
AU - Cohen, Hagai
AU - Bendikov, Tatyana
AU - Lahav, Meir
AU - Lubomirsky, Igor
PY - 2012/8/21
Y1 - 2012/8/21
N2 - Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.
AB - Dr Williams (AIP Adv., 2012, 2, 010701) suggested that cleaning Teflon by high pressure oxygen plasma may have affected our result that Cu 2+ and Pd 2+ ions can be absorbed but not chemically reduced by a Teflon surface rubbed by PMMA (Phys. Chem. Chem. Phys., 2012, 14, 5551). In response, we show that this treatment does not affect the adsorption of Cu 2+ and Pd 2+. We reaffirm our statement that Cu 2+ and Pd 2+ ions can be adsorbed by a Teflon surface only after rubbing with the organic polymers, not before rubbing.
UR - http://www.scopus.com/inward/record.url?scp=84864228116&partnerID=8YFLogxK
U2 - 10.1039/c2cp41505d
DO - 10.1039/c2cp41505d
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AN - SCOPUS:84864228116
SN - 1463-9076
VL - 14
SP - 11185
EP - 11186
JO - Physical Chemistry Chemical Physics
JF - Physical Chemistry Chemical Physics
IS - 31
ER -