The reversible giant change in the contact angle on the polysulfone and polyethersulfone films exposed to UV irradiation

Edward Bormashenko; Roman Pogreb; Gene Whyman; Yelena Bormashenko; Rachel Jager; Tamir Stein; Alex Schechter; Doron Aurbach

doi:10.1021/la800527q

The reversible giant change in the contact angle on the polysulfone and polyethersulfone films exposed to UV irradiation

Edward Bormashenko, Roman Pogreb, Gene Whyman, Yelena Bormashenko, Rachel Jager, Tamir Stein, Alex Schechter, Doron Aurbach

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

37 Scopus citations

Abstract

Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications.

Original language	English
Pages (from-to)	5977-5980
Number of pages	4
Journal	Langmuir
Volume	24
Issue number	12
DOIs	https://doi.org/10.1021/la800527q
State	Published - 17 Jun 2008

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abstract = "Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications.",

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AU - Bormashenko, Edward

AU - Pogreb, Roman

AU - Whyman, Gene

AU - Bormashenko, Yelena

AU - Jager, Rachel

AU - Stein, Tamir

AU - Schechter, Alex

AU - Aurbach, Doron

PY - 2008/6/17

Y1 - 2008/6/17

N2 - Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications.

AB - Water contact angles on polysulfone and polyethersulfone films exposed to UV irradiation have been found to decrease dramatically. We relate this phenomenon to the formation and release of disulfonic acid from the irradiated films, a well-known surfactant. The phenomenon appears to be reversible, namely, cleansed surfaces retained their initial contact angle. The revealed phenomenon may provide a means of controlling the spreading of liquids on polysulfone and polyethersulfone films and seems promising for use in microfluidics applications.

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The reversible giant change in the contact angle on the polysulfone and polyethersulfone films exposed to UV irradiation

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