The pulsed-laser deposition of superconducting thin films

High-critical-temperature (high-T_c) superconductors have generated tremendous interest for the fabrication of superconducting thin films in advanced microelectronic applications. Superconducting thin films operating at liquid nitrogen temperatures offer great possibilities for faster, more sensitive and more precise electronic devices. The pulsed-laser deposition technique is an excellent method of fabricating high-T_c superconducting thin films with exceptional microstructural and property control, and its unique features have made it quite popular. This article discusses the nature of laser-solid-plasma interactions during the deposition process and processing aspects which result in films exhibiting excellent superconducting properties.