Abstract
Selective deprotection of photolabile anomeric 2-nitrobenzyl acetals was achieved using continuous flow photo-reactor (UV radiation at 355 nm) in methanol-water. Various protecting groups such as acetyl, benzyl, benzoyl, benzylidine, TBS, etc. were found to be highly stable during the photolysis.
| Original language | English |
|---|---|
| Pages (from-to) | 227-236 |
| Number of pages | 10 |
| Journal | Journal of the Indian Chemical Society |
| Volume | 97 |
| Issue number | 2 |
| State | Published - Feb 2020 |
| Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2020 Scientific Publishers. All rights reserved.
Keywords
- Anomeric acetals
- Methanol
- Photo-reactor
- Photolabile protecting group
- UV-radiation
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