Abstract
Transparent and conducting aluminium doped ZnO (ZnO:Al) films having different Al:Zn ratio were deposited by simple solgel technique on glass substrates. The films were characterized by microstructural, optical and electrical studies. It was observed that the films were transparent but highly resistive. The films were annealed at 300°C in an (nitrogen (N2) + hydrogen (H2) - 95% + 5%) atmosphere to obtain low resistive films. While the films showed transparency of > 70% in the visible range, the resistivity of the films was of the order of 10-3 Ω cm. The optical constants of the films were studied by a modified KramersKronig model to study its variation with the change in aluminium (Al) concentration.
Original language | English |
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Pages (from-to) | 111-114 |
Number of pages | 4 |
Journal | Functional Materials Letters |
Volume | 3 |
Issue number | 2 |
DOIs | |
State | Published - Jun 2010 |
Externally published | Yes |
Keywords
- Al doping
- Thin films
- ZnO
- electrical
- optical