Surface interaction forces in chemical-mechanical planarization

Krishna Rajan; Rajiv Singh; J. Adler; U. Mahajan; Y. Rabinovich; B. M. Moudgil

doi:10.1016/s0040-6090(97)00501-4

Surface interaction forces in chemical-mechanical planarization

Krishna Rajan, Rajiv Singh, J. Adler, U. Mahajan, Y. Rabinovich, B. M. Moudgil

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

Understanding the role of surface intra-molecular forces is critical in a variety of aspects of chemical-mechanical polishing technology. In this paper we explore some of the critical areas where this is an important parameter, such as material removal mechanisms in oxide polishing. Particular attention is given to the use of coupling single particle atomic force microscopy experiments with FTIR and TEM studies of polished oxide surfaces in studying the possible role of surface hydration effects in chemical-mechanical planarization of oxide thin films.

Original language	English
Pages (from-to)	529-532
Number of pages	4
Journal	Thin Solid Films
Volume	308-309
Issue number	1-4
DOIs	https://doi.org/10.1016/s0040-6090(97)00501-4
State	Published - 31 Oct 1997
Externally published	Yes

Funding

The authors gratefully acknowledge support through the National Science Foundation Engineering Research Center for Particulate Science and Technology (Grant # EEC-94-02989).

Funders	Funder number
National Science Foundation Engineering Research Center for Particulate Science and Technology	EEC-94-02989

Keywords

Atomic force microscopy
Chemical-mechanical planarization
Oxide
Surface potential

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10.1016/s0040-6090(97)00501-4

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AU - Rabinovich, Y.

AU - Moudgil, B. M.

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AB - Understanding the role of surface intra-molecular forces is critical in a variety of aspects of chemical-mechanical polishing technology. In this paper we explore some of the critical areas where this is an important parameter, such as material removal mechanisms in oxide polishing. Particular attention is given to the use of coupling single particle atomic force microscopy experiments with FTIR and TEM studies of polished oxide surfaces in studying the possible role of surface hydration effects in chemical-mechanical planarization of oxide thin films.

KW - Atomic force microscopy

KW - Chemical-mechanical planarization

KW - Oxide

KW - Surface potential

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Surface interaction forces in chemical-mechanical planarization

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Keywords

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