Surface crystallization and thin film melting in normal alkanes

X. Z. Wu; H. H. Shao; B. M. Ocko; M. Deutsch; S. K. Sinha; M. W. Kim; H. E. King; E. B. Sirota

Surface crystallization and thin film melting in normal alkanes

X. Z. Wu, H. H. Shao, B. M. Ocko, M. Deutsch, S. K. Sinha, M. W. Kim, H. E. King, E. B. Sirota

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

Normal alkanes of carbon number n>14 exhibit surface crystallization at their liquid-vapor interface. This has been investigated with x-ray reflectivity, grazing incidence scattering and surface tension measurements. The structure and thermodynamics of the surface layer is consistent with a monolayer of the bulk rotator phase occurring at the surface above the bulk melting temperature. On the other hand, thin films of alkanes on SiO₂, exhibit a reduction of the melting temperature. The surface crystalline phase is observed for carbon number n>14. The vanishing of surface phase for small n may be due to a transition from surface freezing to surface melting behavior. These measurements can yield the relative surface energies of the various phases.

Original language	English
Pages (from-to)	15-26
Number of pages	12
Journal	Materials Research Society Symposium - Proceedings
Volume	366
State	Published - 1995
Externally published	Yes
Event	Proceedings of the 1994 MRS Fall Meeting - Boston, MA, USA Duration: 28 Nov 1994 → 1 Dec 1994

Cite this

@article{e095697706874052822f8b8d19b30961,

title = "Surface crystallization and thin film melting in normal alkanes",

abstract = "Normal alkanes of carbon number n>14 exhibit surface crystallization at their liquid-vapor interface. This has been investigated with x-ray reflectivity, grazing incidence scattering and surface tension measurements. The structure and thermodynamics of the surface layer is consistent with a monolayer of the bulk rotator phase occurring at the surface above the bulk melting temperature. On the other hand, thin films of alkanes on SiO2, exhibit a reduction of the melting temperature. The surface crystalline phase is observed for carbon number n>14. The vanishing of surface phase for small n may be due to a transition from surface freezing to surface melting behavior. These measurements can yield the relative surface energies of the various phases.",

author = "Wu, {X. Z.} and Shao, {H. H.} and Ocko, {B. M.} and M. Deutsch and Sinha, {S. K.} and Kim, {M. W.} and King, {H. E.} and Sirota, {E. B.}",

year = "1995",

language = "אנגלית",

volume = "366",

pages = "15--26",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1994 MRS Fall Meeting ; Conference date: 28-11-1994 Through 01-12-1994",

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TY - JOUR

T1 - Surface crystallization and thin film melting in normal alkanes

AU - Wu, X. Z.

AU - Shao, H. H.

AU - Ocko, B. M.

AU - Deutsch, M.

AU - Sinha, S. K.

AU - Kim, M. W.

AU - King, H. E.

AU - Sirota, E. B.

PY - 1995

Y1 - 1995

N2 - Normal alkanes of carbon number n>14 exhibit surface crystallization at their liquid-vapor interface. This has been investigated with x-ray reflectivity, grazing incidence scattering and surface tension measurements. The structure and thermodynamics of the surface layer is consistent with a monolayer of the bulk rotator phase occurring at the surface above the bulk melting temperature. On the other hand, thin films of alkanes on SiO2, exhibit a reduction of the melting temperature. The surface crystalline phase is observed for carbon number n>14. The vanishing of surface phase for small n may be due to a transition from surface freezing to surface melting behavior. These measurements can yield the relative surface energies of the various phases.

AB - Normal alkanes of carbon number n>14 exhibit surface crystallization at their liquid-vapor interface. This has been investigated with x-ray reflectivity, grazing incidence scattering and surface tension measurements. The structure and thermodynamics of the surface layer is consistent with a monolayer of the bulk rotator phase occurring at the surface above the bulk melting temperature. On the other hand, thin films of alkanes on SiO2, exhibit a reduction of the melting temperature. The surface crystalline phase is observed for carbon number n>14. The vanishing of surface phase for small n may be due to a transition from surface freezing to surface melting behavior. These measurements can yield the relative surface energies of the various phases.

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AN - SCOPUS:0029218101

SN - 0272-9172

VL - 366

SP - 15

EP - 26

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1994 MRS Fall Meeting

Y2 - 28 November 1994 through 1 December 1994

ER -

Surface crystallization and thin film melting in normal alkanes

Abstract

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