Abstract
Superhydrophobic polytetrafluoroethylene films with hierarchical surface roughness were deposited using pulse electron deposition technique. We were able to modulate roughness of the deposited films by controlling the beam energy and hence the electron penetration depth. The films deposited at higher beam energy showed contact angle as high as 166°. The scanning electron and atomic force microscope studies revealed clustered growth and two level sub-micron asperities on films deposited at higher energies. Such dual-scale hierarchical roughness and heterogeneities at the water-surface interface was attributed to the observed contact angle and thus its superhydrophobic nature.
Original language | English |
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Pages (from-to) | 4555-4559 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 517 |
Issue number | 16 |
DOIs | |
State | Published - 30 Jun 2009 |
Externally published | Yes |
Keywords
- Atomic force microscopy
- Dual-scale roughness
- Polytetrafluoroethylene
- Pulsed electron deposition
- Superhydrophobicity
- Thin films