Superhydrophobic polytetrafluoroethylene thin films with hierarchical roughness deposited using a single step vapor phase technique

Sushant Gupta, Arul Chakkaravarthi Arjunan, Sameer Deshpande, Sudipta Seal, Deepika Singh, Rajiv K. Singh

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Superhydrophobic polytetrafluoroethylene films with hierarchical surface roughness were deposited using pulse electron deposition technique. We were able to modulate roughness of the deposited films by controlling the beam energy and hence the electron penetration depth. The films deposited at higher beam energy showed contact angle as high as 166°. The scanning electron and atomic force microscope studies revealed clustered growth and two level sub-micron asperities on films deposited at higher energies. Such dual-scale hierarchical roughness and heterogeneities at the water-surface interface was attributed to the observed contact angle and thus its superhydrophobic nature.

Original languageEnglish
Pages (from-to)4555-4559
Number of pages5
JournalThin Solid Films
Volume517
Issue number16
DOIs
StatePublished - 30 Jun 2009
Externally publishedYes

Keywords

  • Atomic force microscopy
  • Dual-scale roughness
  • Polytetrafluoroethylene
  • Pulsed electron deposition
  • Superhydrophobicity
  • Thin films

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