Supercontinuum generation by saturated second-order nonlinear interactions

Marc Jankowski, Carsten Langrock, Boris Desiatov, Marko Lončar, M. M. Fejer

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

We propose a new approach to supercontinuum generation and carrier-envelope-offset detection based on saturated second-order nonlinear interactions in dispersion-engineered nanowaveguides. The technique developed here broadens the interacting harmonics by forming stable bifurcations of the pulse envelopes due to an interplay between phase-mismatch and pump depletion. We first present an intuitive heuristic model for spectral broadening by second-harmonic generation of femtosecond pulses and show that this model agrees well with experiments. Then, having established strong agreement between theory and experiment, we develop scaling laws that determine the energy required to generate an octave of bandwidth as a function of input pulse duration, device length, and input pulse chirp. These scaling laws suggest that future realization based on this approach could enable supercontinuum generation with orders of magnitude less energy than current state-of-the-art devices.

Original languageEnglish
Article number116104
JournalAPL Photonics
Volume8
Issue number11
DOIs
StatePublished - 1 Nov 2023
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2023 Author(s).

Funding

This study was funded by the National Science Foundation (NSF) (Grant Nos. ECCS-1609549, ECCS-1609688, EFMA-1741651, CCF-1918549, and OMA-2137723); AFOSR MURI (Grant No. FA9550-14-1-0389); and Army Research Laboratory (ARL) (Grant Nos. W911NF-15-2-0060 and W911NF-18-1-0285). The authors wish to acknowledge NTT Research for their financial and technical support. Electrode patterning and poling were performed at the Stanford Nanofabrication Facility, the Stanford Nano Shared Facilities (NSF Award No. ECCS-2026822), and the Cell Sciences Imaging Facility (NCRR Award No. S10RR02557401). Patterning and dry etching were performed at the Harvard University Center for Nanoscale Systems (CNS), a member of the National Nanotechnology Coordinated Infrastructure (NNCI) supported by the National Science Foundation.

FundersFunder number
Harvard University Center for Nanoscale Systems
National Science FoundationEFMA-1741651, ECCS-1609549, CCF-1918549, OMA-2137723, ECCS-1609688
Air Force Office of Scientific ResearchFA9550-14-1-0389
Army Research LaboratoryW911NF-15-2-0060, W911NF-18-1-0285
Cognitive Neuroscience Society

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