Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures

Z. Zalevsky, Y. Danan, R. Menon

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Original languageAmerican English
Title of host publicationProf. of Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online) (Optical Society of America, 2017), paper CW4B.2
StatePublished - 2017

Bibliographical note

Place of conference:USA

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