Submicrometer chemical patterning with high throughput using magnetolithography

Amos Bardea, Ron Naaman

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

This letter demonstrates the ability to pattern surfaces chemically with submicrometer resolution by applying the simple and inexpensive magnetolithography (ML) method. This method allows fast patterning of large surfaces without having to face contamination problems or the need to remove the substrate from the solution. With ML it is possible to obtain pattern whose width is narrower than the width of the lines in the mask. By applying the green fluorescent protein (GFP), we were able to probe a 30 nm line of hydrophobic molecules patterned on a substrate coated with a hydrophilic monolayer.

Original languageEnglish
Pages (from-to)5451-5454
Number of pages4
JournalLangmuir
Volume25
Issue number10
DOIs
StatePublished - 19 May 2009
Externally publishedYes

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