Strongly Correlated Fractional Quantum Hall Line Junctions

U. Zülicke; E. Shimshoni

doi:10.1103/PhysRevLett.90.026802

Strongly Correlated Fractional Quantum Hall Line Junctions

U. Zülicke
, E. Shimshoni

Karlsruhe Institute of Technology
University of Haifa
Rutgers - The State University of New Jersey, New Brunswick

Research output: Contribution to journal › Article › peer-review

Abstract

We have studied a clean finite-length line junction between interacting counterpropagating single-branch fractional quantum Hall edge channels. Exact solutions for low-lying excitations and transport properties are obtained when the two edges belong to quantum Hall systems with different filling factors and interact via the long-range Coulomb interaction. Charging effects due to the coupling to external edge-channel leads are fully taken into account. Conductances and power laws in the current-voltage characteristics of tunneling are strongly affected by interedge correlations.

Original language	English
Pages (from-to)	4
Number of pages	1
Journal	Physical Review Letters
Volume	90
Issue number	2
DOIs	https://doi.org/10.1103/PhysRevLett.90.026802
State	Published - 2003
Externally published	Yes

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10.1103/PhysRevLett.90.026802

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Strongly Correlated Fractional Quantum Hall Line Junctions

Abstract

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