STED like microscopy based on plasma dispersion effect in silicon

Hadar Pinhas, Yossef Danan, Moshe Sinvani, Meir Danino, Zeev Zalevsky

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We present a new method for laser beam shaping, in silicon, based on plasma dispersion effect (PDE) and use it to overcome the diffraction resolution limit in silicon in approach similar to stimulated emission depletion (STED) scanning fluorescence microscopy.

Original languageEnglish
Title of host publicationComputational Optical Sensing and Imaging, COSI 2017
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)9781943580293
ISBN (Print)9781943580293
DOIs
StatePublished - 2017
EventComputational Optical Sensing and Imaging, COSI 2017 - San Francisco, United States
Duration: 26 Jun 201729 Jun 2017

Publication series

NameOptics InfoBase Conference Papers
VolumePart F46-COSI 2017
ISSN (Electronic)2162-2701

Conference

ConferenceComputational Optical Sensing and Imaging, COSI 2017
Country/TerritoryUnited States
CitySan Francisco
Period26/06/1729/06/17

Bibliographical note

Publisher Copyright:
© 2016 OSA.

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