Soft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices

Svetlana M. Mitrovski; Shraddha Avasthy; Evan M. Erickson; Matthew E. Stewart; John A. Rogers; Ralph G. Nuzzo

doi:10.1002/9780470405789.ch12

Soft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices

Svetlana M. Mitrovski
, Shraddha Avasthy
, Evan M. Erickson
, Matthew E. Stewart
, John A. Rogers
, Ralph G. Nuzzo

Department of Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

1 Scopus citations

Original language	English
Title of host publication	Unconventional Nanopatterning Techniques and Applications
Publisher	John Wiley and Sons
Pages	293-323
Number of pages	31
ISBN (Print)	9780470099575
DOIs	https://doi.org/10.1002/9780470405789.ch12
State	Published - 30 Apr 2008

Keywords

Concentration gradients and microfluidic devices
MEMS and optical device soft lithography
Optics and microfluidics

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10.1002/9780470405789.ch12

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keywords = "Concentration gradients and microfluidic devices, MEMS and optical device soft lithography, Optics and microfluidics",

author = "Mitrovski, \{Svetlana M.\} and Shraddha Avasthy and Erickson, \{Evan M.\} and Stewart, \{Matthew E.\} and Rogers, \{John A.\} and Nuzzo, \{Ralph G.\}",

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T1 - Soft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices

AU - Mitrovski, Svetlana M.

AU - Avasthy, Shraddha

AU - Erickson, Evan M.

AU - Stewart, Matthew E.

AU - Rogers, John A.

AU - Nuzzo, Ralph G.

PY - 2008/4/30

Y1 - 2008/4/30

KW - Concentration gradients and microfluidic devices

KW - MEMS and optical device soft lithography

KW - Optics and microfluidics

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SN - 9780470099575

SP - 293

EP - 323

BT - Unconventional Nanopatterning Techniques and Applications

PB - John Wiley and Sons

ER -

Soft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices

Keywords

Access to Document

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