Simulation of silicon etching in NF₃ plasma reactor

Keyphrases

• Reactor 100%
• Silicon Etching 100%
• Plasma Reactor 100%
• Gas Species 75%
• In-house Experiment 75%
• Surface Chemistry 50%
• Surface Species 50%
• Plasma Chemistry 50%
• Chemistry Model 50%
• Plasma Etching 50%
• Metal Surface 25%
• Gas Chemistry 25%
• Simulation Model 25%
• Flow Dynamics 25%
• Integrated Circuits 25%
• Etching Rate 25%
• Etching Process 25%
• Geometrical Parameters 25%
• Vapor Deposition 25%
• Experimental Parameters 25%
• Surface Cleaning 25%
• Volatile Species 25%
• Mass Flow Rate 25%
• Plasma Discharge 25%
• Surface Etching 25%
• Event Dependence 25%
• RF Power Deposition 25%
• Mixed Plasma 25%
• Reactor Performance 25%
• Chip Fabrication 25%
• Plasma Etching Process 25%
• Microelectronic chip 25%
• Reactor Parameters 25%

Engineering

• Plasma Reactor 100%
• Gas Specie 100%
• Etching Process 66%
• Simulation Result 33%
• Experimental Result 33%
• Simulation Model 33%
• Integrated Circuit 33%
• Etch Rate 33%
• Microelectronics 33%
• Geometrical Parameter 33%
• Simulated Result 33%
• Experimental Parameter 33%
• Surface Cleaning 33%
• Flow Dynamics 33%
• Vapor Deposition 33%
• Mass Flowrate 33%

Material Science

• Silicon 100%
• Plasma Etching 100%
• Metal Surface 33%
• Electronic Circuit 33%
• Surface Cleaning 33%
• Flow Dynamics 33%