Abstract
We demonstrate the design, fabrication and experimental characterization of submicron-scale silicon waveguide fabricated by local oxidation of silicon and provide guidelines for controlling its profile. Near field measurements shows submicron confinement of the optical mode.
| Original language | English |
|---|---|
| Journal | Optics InfoBase Conference Papers |
| State | Published - 2010 |
| Externally published | Yes |
| Event | Frontiers in Optics, FiO 2010 - Rochester, NY, United States Duration: 24 Oct 2010 → 28 Oct 2010 |