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Rapid and gentle chemical mechanical planarization of Wide BandGap semiconductors
Arul Chakkaravarthi Arjunan
, Hung Ta Wang
, Deepika Singh
, Stephen J. Pearton
, Fan Ren
, Rajiv K. Singh
Sinmat Incorporated
University of Florida
Research output
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peer-review
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Dive into the research topics of 'Rapid and gentle chemical mechanical planarization of Wide BandGap semiconductors'. Together they form a unique fingerprint.
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Keyphrases
Atomic Scale
20%
Characterization Techniques
20%
Chemical Effect
20%
Chemical Mechanical Planarization
100%
Device Fabrication
20%
Polishing Rate
20%
Semiconductor Substrate
20%
Slurry
40%
Substrate Fabrication
20%
Unique Characterizations
20%
Wafer Surface
20%
Wide Band Gap Semiconductors
100%
Wide Bandgap
20%
Engineering
Characterization Method
20%
Chemical Effect
20%
Chemical Mechanical Polishing
100%
Energy Gap
40%
Gap Semiconductor
20%
Wide Bandgap Semiconductor
100%
Material Science
Chemical Mechanical Planarization
100%
Device Fabrication
20%
Polishing
20%
Wide Band Gap Semiconductor
20%
Wide Bandgap Semiconductor
100%