Random multiplicative processes and transport in structures with correlated spatial disorder

S. Havlin, R. Blumberg Selinger, M. Schwartz, H. E. Stanley, A. Bunde

Research output: Contribution to journalArticlepeer-review

92 Scopus citations

Abstract

We show that strong spatial correlations in a random resistor network can dramatically alter its transport properties. We calculate the average logarithmic resistance of a topologically one-dimensional model characterized by a random multiplicative process. We find a transport exponent that depends explicitly on the form of the spatial correlations; we also find that this problem is related to diffusion in the presence of correlated random fields.

Original languageEnglish
Pages (from-to)1438-1441
Number of pages4
JournalPhysical Review Letters
Volume61
Issue number13
DOIs
StatePublished - 1988

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