Quantum lithography by coherent control of classical light pulses

Avi Pe'er, Barak Dayan, Marija Vucelja, Yaron Silberberg, Asher A. Friesem

Research output: Contribution to journalArticlepeer-review

58 Scopus citations

Abstract

The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.

Original languageEnglish
Pages (from-to)6600-6605
Number of pages6
JournalOptics Express
Volume12
Issue number26
DOIs
StatePublished - Dec 2004
Externally publishedYes

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