Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films

Vera Lyahovitskaya; Ilya Zon; Yishay Feldman; Sidney R. Cohen; Alexander K. Tagantsev; Igor Lubomirsky

doi:10.1002/adma.200305346

Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films

Vera Lyahovitskaya, Ilya Zon, Yishay Feldman, Sidney R. Cohen, Alexander K. Tagantsev, Igor Lubomirsky

Research output: Contribution to journal › Article › peer-review

36 Scopus citations

Abstract

The magnitude of pyroelectricity in highly stressed quasi-amorphous thin films was analyzed. The amorphous BaTiO₃ layers were deposited by radio frequency (RF) magnetron oxygen plasma sputtering. The stress in the BaTiO₃ films was measured by the substrate curvature method. It was found that the films that passed through the temperature gradient showed large pyroelectric effect over the temperature range of 20-150 °C.

Original language	English
Pages (from-to)	1826-1828
Number of pages	3
Journal	Advanced Materials
Volume	15
Issue number	21
DOIs	https://doi.org/10.1002/adma.200305346
State	Published - 4 Nov 2003
Externally published	Yes

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title = "Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films",

abstract = "The magnitude of pyroelectricity in highly stressed quasi-amorphous thin films was analyzed. The amorphous BaTiO3 layers were deposited by radio frequency (RF) magnetron oxygen plasma sputtering. The stress in the BaTiO3 films was measured by the substrate curvature method. It was found that the films that passed through the temperature gradient showed large pyroelectric effect over the temperature range of 20-150 °C.",

author = "Vera Lyahovitskaya and Ilya Zon and Yishay Feldman and Cohen, {Sidney R.} and Tagantsev, {Alexander K.} and Igor Lubomirsky",

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AU - Lyahovitskaya, Vera

AU - Zon, Ilya

AU - Feldman, Yishay

AU - Cohen, Sidney R.

AU - Tagantsev, Alexander K.

AU - Lubomirsky, Igor

PY - 2003/11/4

Y1 - 2003/11/4

N2 - The magnitude of pyroelectricity in highly stressed quasi-amorphous thin films was analyzed. The amorphous BaTiO3 layers were deposited by radio frequency (RF) magnetron oxygen plasma sputtering. The stress in the BaTiO3 films was measured by the substrate curvature method. It was found that the films that passed through the temperature gradient showed large pyroelectric effect over the temperature range of 20-150 °C.

AB - The magnitude of pyroelectricity in highly stressed quasi-amorphous thin films was analyzed. The amorphous BaTiO3 layers were deposited by radio frequency (RF) magnetron oxygen plasma sputtering. The stress in the BaTiO3 films was measured by the substrate curvature method. It was found that the films that passed through the temperature gradient showed large pyroelectric effect over the temperature range of 20-150 °C.

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Pyroelectricity in Highly Stressed Quasi-Amorphous Thin Films

Abstract

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