Pulsed laser deposition of Y2O3:Eu thin film phosphors

Sean L. Jones, D. Kumar, K. G. Cho, R. Singh, Paul H. Holloway

Research output: Contribution to journalArticlepeer-review

106 Scopus citations


Thin films of Y2O3:Eu cathodoluminescent (CL) phosphors were deposited using pulsed laser deposition using deposition temperature between 250 °C and 800 °C, O2 pressures between residual vacuum (2×10-5 Torr) and 6 Torr, and post annealing up to 1200° for 1 h in air. The CL efficiency of the best thin film was about one third that of the starting powder. The brightness and efficiency of the thin films improved as the deposition temperature, O2 pressure and post annealing temperature were increased, except that O2 pressures above 600 mTorr did not significantly improve the CL properties. At deposition temperatures >600 °C, the surface morphology changed from a smooth film to a nodular deposit for O2 pressures >200 mTorr, with nodule dimensions ≈100 nm. Simultaneously, the CL properties improved dramatically because of enhanced optical scattering out of the thin film. Optical scattering was discussed in terms of anomalous diffraction. The CL properties also improved dramatically with high temperature post annealing. This effect was interpreted in terms of improved crystallinity and activation of the Eu. The low brightness and efficiency of thin films versus powder was affected by depletion of the Eu in the thin films owing to the deposition process.

Original languageEnglish
Pages (from-to)151-167
Number of pages17
Issue number4
StatePublished - 10 Feb 1999
Externally publishedYes


This work was supported by DARPA Contract # MDA 972-93-1-0030 through the Phosphor Technology C enter of Excellence.

FundersFunder number
Defense Advanced Research Projects AgencyMDA 972-93-1-0030


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