Abstract
We have developed a new, efficient method to dope bulk single crystals of CdTe by In, via gas phase diffusion, using In4Te3 as the source. Doping was carried out on crystals of very high resistivity (>5 MΩ cm), following annealing in the temperature range of 350-1000°C. Resulting crystals showed n-type conductivity with a free carrier concentration in the range of 1015-1018 cm-3 and carrier mobility of 100-750 cm2/(V s), depending on the annealing temperature and time, and on the cooling conditions. Incorporation of In was found to be a function of annealing time and temperature only. Up to 650°C, the In and the free electron concentrations are roughly the same.
Original language | English |
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Pages (from-to) | 106-112 |
Number of pages | 7 |
Journal | Journal of Crystal Growth |
Volume | 197 |
Issue number | 1-2 |
DOIs | |
State | Published - 1999 |
Externally published | Yes |
Funding
This work was supported by the German–Israeli Foundation for Scientific Research and the Israel Science Foundation, Jerusalem, Israel. We thank Rami Cohen and Igor Lubomirski for help in measurements and fruitful discussions.
Funders | Funder number |
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German-Israeli Foundation for Scientific Research | |
Israel Science Foundation |
Keywords
- CdTe
- Doping
- In
- InTe