Post-growth, In doping of CdTe single crystals via vapor phase

Vera Lyahovitskaya, Larissa Kaplan, Jaydeb Goswami, David Cahen

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We have developed a new, efficient method to dope bulk single crystals of CdTe by In, via gas phase diffusion, using In4Te3 as the source. Doping was carried out on crystals of very high resistivity (>5 MΩ cm), following annealing in the temperature range of 350-1000°C. Resulting crystals showed n-type conductivity with a free carrier concentration in the range of 1015-1018 cm-3 and carrier mobility of 100-750 cm2/(V s), depending on the annealing temperature and time, and on the cooling conditions. Incorporation of In was found to be a function of annealing time and temperature only. Up to 650°C, the In and the free electron concentrations are roughly the same.

Original languageEnglish
Pages (from-to)106-112
Number of pages7
JournalJournal of Crystal Growth
Volume197
Issue number1-2
DOIs
StatePublished - 1999
Externally publishedYes

Funding

This work was supported by the German–Israeli Foundation for Scientific Research and the Israel Science Foundation, Jerusalem, Israel. We thank Rami Cohen and Igor Lubomirski for help in measurements and fruitful discussions.

FundersFunder number
German-Israeli Foundation for Scientific Research
Israel Science Foundation

    Keywords

    • CdTe
    • Doping
    • In
    • InTe

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