TY - JOUR
T1 - Phosphonate-anchored thin films on titanium and niobium oxide surfaces
T2 - Fabrication and characterization
AU - Adadi, Racheli
AU - Zorn, Gilad
AU - Brener, Reuven
AU - Gotman, Irena
AU - Gutmanas, Elazar Y.
AU - Sukenik, Chaim N.
PY - 2010/2/1
Y1 - 2010/2/1
N2 - Phosphonate-anchored thin films form on various metal oxide substrates. This paper compares structural details of these covalently anchored films on the oxidized surfaces of titanium, niobium and a Ti45Nb alloy. This is made possible by a sample configuration wherein the alkylphosphonates are coated onto a thin film of metal which is sputtered onto a double-side-polished silicon wafer and then oxidized. Samples are flat and reflective and are suitable for ellipsometry, wetting measurements, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy, and Fourier Transform Infrared-Attenuated Total Reflectance Spectroscopy. Deposition from heated tetrahydrofuran produces ordered films with measurable differences among deposition protocols and among metal oxide substrates. These substrates enable identification of the mildest deposition procedures that still provide uniform, robust surface coatings.
AB - Phosphonate-anchored thin films form on various metal oxide substrates. This paper compares structural details of these covalently anchored films on the oxidized surfaces of titanium, niobium and a Ti45Nb alloy. This is made possible by a sample configuration wherein the alkylphosphonates are coated onto a thin film of metal which is sputtered onto a double-side-polished silicon wafer and then oxidized. Samples are flat and reflective and are suitable for ellipsometry, wetting measurements, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy, and Fourier Transform Infrared-Attenuated Total Reflectance Spectroscopy. Deposition from heated tetrahydrofuran produces ordered films with measurable differences among deposition protocols and among metal oxide substrates. These substrates enable identification of the mildest deposition procedures that still provide uniform, robust surface coatings.
KW - Atomic Force Microscopy
KW - Fourier Transform Infra Red Spectroscopy
KW - Phosphonate-anchored thin films
KW - X-ray Photoelectron Spectroscopy
UR - http://www.scopus.com/inward/record.url?scp=73949149990&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2009.07.038
DO - 10.1016/j.tsf.2009.07.038
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AN - SCOPUS:73949149990
SN - 0040-6090
VL - 518
SP - 1966
EP - 1972
JO - Thin Solid Films
JF - Thin Solid Films
IS - 8
ER -