Abstract
Highly ordered ZnO crystals of 0.15 μm width and 0.5 μm length were grown on silicon wafers coated with a monolayer of SiCl3(CH 2)11-O-C6H5 molecules. Various techniques (contact angle measurements, ellipsometry, ATR-FTIR) were employed for determining the quality of the monolayer coating. In addition, the bare and silane-coated Si wafers were studied by X-ray reflectivity (XR) and grazing-incidence diffraction (GID) using synchrotron radiation. The results obtained point to a possible relationship between the organization of the self-assembled monolayer (SAM) coating, the dipole moment of the headgroup, and the orientation of the ZnO crystals.
Original language | English |
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Pages (from-to) | 169-175 |
Number of pages | 7 |
Journal | Crystal Growth and Design |
Volume | 4 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2004 |
Bibliographical note
Funding Information:We thank the Antarctic Support Associates staff at the South Pole for making a successful season possible, and Ted Griffith, Bob Pernic, and Bill Vinje for valuable assistance there. This research was supported by the James S. McDonnell Foundation, PYI grant NSF AST 90-57089, and the National Science Foundation under a cooperative agreement with the Center for Astrophysical Research in Antarctica (CARA), grant NSF OPP 89-20223. CARA is an NSF Science and Technology Center. J. R. was supported by the McCormick Fellowship at the University of Chicago.