Oriented Growth of ZnO Crystals on Self-Assembled Monolayers of Functionalized Alkyl Silanes

R. Turgeman, O. Gershevitz, O. Palchik, M. Deutsch, B. M. Ocko, A. Gedanken, C. N. Sukenik

Research output: Contribution to journalArticlepeer-review

12 Scopus citations


Highly ordered ZnO crystals of 0.15 μm width and 0.5 μm length were grown on silicon wafers coated with a monolayer of SiCl3(CH 2)11-O-C6H5 molecules. Various techniques (contact angle measurements, ellipsometry, ATR-FTIR) were employed for determining the quality of the monolayer coating. In addition, the bare and silane-coated Si wafers were studied by X-ray reflectivity (XR) and grazing-incidence diffraction (GID) using synchrotron radiation. The results obtained point to a possible relationship between the organization of the self-assembled monolayer (SAM) coating, the dipole moment of the headgroup, and the orientation of the ZnO crystals.

Original languageEnglish
Pages (from-to)169-175
Number of pages7
JournalCrystal Growth and Design
Issue number1
StatePublished - Jan 2004

Bibliographical note

Funding Information:
We thank the Antarctic Support Associates staff at the South Pole for making a successful season possible, and Ted Griffith, Bob Pernic, and Bill Vinje for valuable assistance there. This research was supported by the James S. McDonnell Foundation, PYI grant NSF AST 90-57089, and the National Science Foundation under a cooperative agreement with the Center for Astrophysical Research in Antarctica (CARA), grant NSF OPP 89-20223. CARA is an NSF Science and Technology Center. J. R. was supported by the McCormick Fellowship at the University of Chicago.


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