Optical waveguide on silicon made by zone melting method

Uriel Hanuka, Yair Zigman, Maor Tiferet, Zeev Zalevsky, Moshe Sinvani

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper we introduce a novel method of making micro-waveguides on silicon surface by the use of the Zone Refining Method. We produce the melting zone by a laser beam focused on the surface of a doped silicon slab to create a melting spot on its surface. By moving the melt zone across the silicon sample we can write a path of higher index of refraction on the silicon. The depth and the width of the waveguide can be determined by the wavelength and the spot diameter of the laser, respectively. We demonstrate the production of 1X4 μm2 channel on the silicon, by using 532 nm laser beam. This method can be applied in microelectronics for the manufacture of light waveguides on integrated optoelectronics ICs.

Original languageEnglish
Title of host publicationLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV
EditorsGediminas Raciukaitis, Carlos Molpeceres, Jie Qiao, Aiko Narazaki
PublisherSPIE
ISBN (Electronic)9781510632974
DOIs
StatePublished - 2020
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV 2020 - San Francisco, United States
Duration: 3 Feb 20205 Feb 2020

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11267
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV 2020
Country/TerritoryUnited States
CitySan Francisco
Period3/02/205/02/20

Bibliographical note

Publisher Copyright:
© 2020 SPIE.

Keywords

  • Impurities
  • Micro-waveguides
  • Plasma dispersion
  • Silicon
  • Zone refining

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