In this paper we introduce a novel method of making micro-waveguides on silicon surface by the use of the Zone Refining Method. We produce the melting zone by a laser beam focused on the surface of a doped silicon slab to create a melting spot on its surface. By moving the melt zone across the silicon sample we can write a path of higher index of refraction on the silicon. The depth and the width of the waveguide can be determined by the wavelength and the spot diameter of the laser, respectively. We demonstrate the production of 1X4 μm2 channel on the silicon, by using 532 nm laser beam. This method can be applied in microelectronics for the manufacture of light waveguides on integrated optoelectronics ICs.
|Title of host publication
|Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV
|Gediminas Raciukaitis, Carlos Molpeceres, Jie Qiao, Aiko Narazaki
|Published - 2020
|Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV 2020 - San Francisco, United States
Duration: 3 Feb 2020 → 5 Feb 2020
|Proceedings of SPIE - The International Society for Optical Engineering
|Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXV 2020
|3/02/20 → 5/02/20
Bibliographical notePublisher Copyright:
© 2020 SPIE.
- Plasma dispersion
- Zone refining