Optical method and system for extended depth of focus

Z. Zalevsky

Optical method and system for extended depth of focus

Xceed Imaging Ltd.

Research output: Patent

Abstract

An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.

Original language	American English
Patent number	US patent No. 7061693
State	Published - 2004

Bibliographical note

US patent No. 7365917; US patent No. 7859769; US patent No. 8192022; South Korean Patent No. 1165051; Japanese Patent Application No. 2007-526697; Singapure patent No. 129858; Russia patent No. 2436135; China patent No. ZL 200580027819.6

Cite this

@misc{85fa32ae532c496bb3a1d34461f512d7,

title = "Optical method and system for extended depth of focus",

abstract = "An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.",

author = "Z. Zalevsky",

note = "US patent No. 7365917; US patent No. 7859769; US patent No. 8192022; South Korean Patent No. 1165051; Japanese Patent Application No. 2007-526697; Singapure patent No. 129858; Russia patent No. 2436135; China patent No. ZL 200580027819.6; US patent No. 7061693",

year = "2004",

language = "American English",

publisher = "Washington, DC: U.S. Patent and Trademark Office",

type = "Patent",

}

TY - PAT

T1 - Optical method and system for extended depth of focus

AU - Zalevsky, Z.

N1 - US patent No. 7365917; US patent No. 7859769; US patent No. 8192022; South Korean Patent No. 1165051; Japanese Patent Application No. 2007-526697; Singapure patent No. 129858; Russia patent No. 2436135; China patent No. ZL 200580027819.6

PY - 2004

Y1 - 2004

N2 - An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.

AB - An imaging arrangement and method for extended the depth of focus are provided. The imaging arrangement comprises an imaging lens having a certain affective aperture, and an optical element associated with said imaging lens. The optical element is configured as a phase-affecting, non-diffractive optical element defining a spatially low frequency phase transition. The optical element and the imaging lens define a predetermined pattern formed by spaced-apart substantially optically transparent features of different optical properties. Position of at least one phase transition region of the optical element within the imaging lens plane is determined by at least a dimension of said affective aperture.

UR - https://patents.google.com/patent/US7061693B2/en

M3 - Patent

M1 - US patent No. 7061693

PB - Washington, DC: U.S. Patent and Trademark Office

ER -

Optical method and system for extended depth of focus

Abstract

Bibliographical note

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