Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination

E. Ben-Eliezer; E. Marom; N. Konforti; Z. Zalevsky

Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination

E. Ben-Eliezer (Inventor), E. Marom (Inventor), N. Konforti (Inventor), Z. Zalevsky (Inventor)

Tel Aviv University

Research output: Patent

Abstract

A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.

Original language	American English
Patent number	US patent No. 8570655
State	Published - 2005

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title = "Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination",

abstract = "A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.",

author = "E. Ben-Eliezer and E. Marom and N. Konforti and Z. Zalevsky",

year = "2005",

language = "American English",

publisher = "Washington, DC: U.S. Patent and Trademark Office",

type = "Patent",

note = "US patent No. 8570655",

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TY - PAT

T1 - Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination

AU - Ben-Eliezer, E.

AU - Marom, E.

AU - Konforti, N.

AU - Zalevsky, Z.

PY - 2005

Y1 - 2005

N2 - A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.

AB - A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.

UR - https://patents.google.com/patent/US8570655B2/en

M3 - Patent

M1 - US patent No. 8570655

PB - Washington, DC: U.S. Patent and Trademark Office

ER -

Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination

Abstract

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