TY - GEN
T1 - Novel reactive chemical mechanical polishing technology for fabrication of SiC mirrors
AU - Singh, Rajiv K.
AU - Arjunan, Arul Chakkaravarthi
AU - Balasundaram, Kannan
AU - Jawali, Puneet
AU - Ling, George
AU - Singh, Deepika
AU - Everson, William
PY - 2013
Y1 - 2013
N2 - A new reactive chemical mechanical polishing process has been developed and optimized for polishing CVD SiC mirror samples. The studies show that the abrasives, chemical nature of the slurry, and other additives play an important role in the material removal rate and surface finish of the SiC mirror. The use of different abrasive types and sizes resulted in differing roughness and removal rates. The smaller abrasives created surface defectivity or higher roughness. This can be explained by different polishing rates of different orientations of SiC grains, resulting in the grain enhancement. Under optimal conditions with appropriate abrasive particles, roughness RMS as low as 0.2 nm was achieved on CVD SiC samples. The process also did not show any scratch-like features in the optical interferometry measurements.
AB - A new reactive chemical mechanical polishing process has been developed and optimized for polishing CVD SiC mirror samples. The studies show that the abrasives, chemical nature of the slurry, and other additives play an important role in the material removal rate and surface finish of the SiC mirror. The use of different abrasive types and sizes resulted in differing roughness and removal rates. The smaller abrasives created surface defectivity or higher roughness. This can be explained by different polishing rates of different orientations of SiC grains, resulting in the grain enhancement. Under optimal conditions with appropriate abrasive particles, roughness RMS as low as 0.2 nm was achieved on CVD SiC samples. The process also did not show any scratch-like features in the optical interferometry measurements.
UR - http://www.scopus.com/inward/record.url?scp=84886737213&partnerID=8YFLogxK
U2 - 10.1117/12.2024765
DO - 10.1117/12.2024765
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AN - SCOPUS:84886737213
SN - 9780819496874
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems
T2 - 2013 Conference on Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems
Y2 - 26 August 2013 through 28 August 2013
ER -