Novel rapid polishing process for fabrication of sapphire windows

Rajiv K. Singh, Arul Chakkaravarthi Arjunan, Kannan Balasundaram, Jinhyung Lee, George Ling, Deepika Singh

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Sapphire is uniquely suitable for sensor windows of electro-optical systems due to its high transparency, high mechanical strength, and chemical inactivity. Unfortunately, these same characteristics also cause polishing of sapphire windows to be extremely difficult and slow. Hence the challenge is to develop a process for affordable production of large area sapphire windows with low-roughness, low-stress and without surface and subsurface damage. Here we report a novel rapid chemical mechanical polishing process that increases the material removal rate during polishing of sapphire by greater than twofold over conventional processes. Such a process can also produce angstrom level surface finish.

Original languageEnglish
Title of host publicationMaterial Technologies and Applications to Optics, Structures, Components, and Sub-Systems
DOIs
StatePublished - 2013
Externally publishedYes
Event2013 Conference on Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems - San Diego, CA, United States
Duration: 26 Aug 201328 Aug 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8837
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference2013 Conference on Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems
Country/TerritoryUnited States
CitySan Diego, CA
Period26/08/1328/08/13

Keywords

  • A-plane
  • C-plane
  • CMP
  • Chemical mechanical polishing
  • Colloidal silica
  • Polishing
  • Sapphire
  • Slurry
  • Windows

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