Novel method for the formation of large-grained, silicon thin films on amorphous substrates

Keyphrases

• Annealing 100%
• Silicon Thin Film 100%
• Large Grain 100%
• Amorphous Substrate 100%
• Low Temperature 50%
• Composite Structures 50%
• Annealing Temperature 50%
• Silicon Film 50%
• Crystallization Process 50%
• Annealing Process 50%
• Silicon Surface 50%
• Amorphous Silicon 50%
• Doped Films 50%
• Hall Measurement 50%
• Hole Mobility 50%
• Multicrystalline Silicon 50%
• Boron Doping 50%
• Low Temperature Process 50%
• Solid-phase Crystallization 50%
• Textured Silicon 50%

Engineering

• Annealing Temperature 100%
• Low-Temperature 100%
• Composite Structure 100%
• Silicon Surface 100%
• Conducted Measurement 100%
• Silicon Single Crystal 100%
• Film Silicon 100%
• Thin Films 100%

Material Science

• Film 100%
• Amorphous Material 100%
• Silicon 100%
• Thin Films 100%
• Single Crystal 25%
• Amorphous Silicon 25%
• Boron 25%
• Hole Mobility 25%