Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Tuyen Nguyen, Adib Tavakoli, Sebastien Triqueneaux, Rahul Swami, Aki Ruhtinas, Jeremy Gradel, Pablo Garcia-Campos, Klaus Hasselbach, Aviad Frydman, Benjamin Piot, Mathieu Gibert, Eddy Collin, Olivier Bourgeois

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.

Original languageEnglish
Pages (from-to)348-356
Number of pages9
JournalJournal of Low Temperature Physics
Volume197
Issue number5-6
DOIs
StatePublished - 1 Dec 2019

Bibliographical note

Publisher Copyright:
© 2019, Springer Science+Business Media, LLC, part of Springer Nature.

Keywords

  • Nanoscale
  • Niobium nitride
  • Resistive thermometry
  • Thin film

Fingerprint

Dive into the research topics of 'Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry'. Together they form a unique fingerprint.

Cite this