Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Tuyen Nguyen; Adib Tavakoli; Sebastien Triqueneaux; Rahul Swami; Aki Ruhtinas; Jeremy Gradel; Pablo Garcia-Campos; Klaus Hasselbach; Aviad Frydman; Benjamin Piot; Mathieu Gibert; Eddy Collin; Olivier Bourgeois

doi:10.1007/s10909-019-02222-6

Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Tuyen Nguyen, Adib Tavakoli, Sebastien Triqueneaux, Rahul Swami, Aki Ruhtinas, Jeremy Gradel, Pablo Garcia-Campos, Klaus Hasselbach, Aviad Frydman, Benjamin Piot, Mathieu Gibert, Eddy Collin, Olivier Bourgeois

Department of Physics

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.

Original language	English
Pages (from-to)	348-356
Number of pages	9
Journal	Journal of Low Temperature Physics
Volume	197
Issue number	5-6
DOIs	https://doi.org/10.1007/s10909-019-02222-6
State	Published - 1 Dec 2019

Bibliographical note

Publisher Copyright:
© 2019, Springer Science+Business Media, LLC, part of Springer Nature.

Keywords

Nanoscale
Niobium nitride
Resistive thermometry
Thin film

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10.1007/s10909-019-02222-6

Cite this

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abstract = "We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.",

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AU - Triqueneaux, Sebastien

AU - Swami, Rahul

AU - Ruhtinas, Aki

AU - Gradel, Jeremy

AU - Garcia-Campos, Pablo

AU - Hasselbach, Klaus

AU - Frydman, Aviad

AU - Piot, Benjamin

AU - Gibert, Mathieu

AU - Collin, Eddy

AU - Bourgeois, Olivier

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KW - Resistive thermometry

KW - Thin film

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Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Abstract

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Keywords

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