Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy

Meir Grajower; Yoel Sebbag; Alex Naiman; Boris Desiatov; Uriel Levy

Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy

Meir Grajower, Yoel Sebbag, Alex Naiman, Boris Desiatov, Uriel Levy

Hebrew University of Jerusalem

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

Original language	English
Title of host publication	2015 Conference on Lasers and Electro-Optics, CLEO 2015
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781557529688
State	Published - 10 Aug 2015
Externally published	Yes
Event	Conference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States Duration: 10 May 2015 → 15 May 2015

Publication series

Name	Conference on Lasers and Electro-Optics Europe - Technical Digest
Volume	2015-August

Conference

Conference	Conference on Lasers and Electro-Optics, CLEO 2015
Country/Territory	United States
City	San Jose
Period	10/05/15 → 15/05/15

Bibliographical note

Publisher Copyright:
© 2015 OSA.

Keywords

Fiber nonlinear optics
Nanoscale devices
Optical imaging
Optical variables measurement
Optical waveguides
Silicon

Cite this

Grajower, M., Sebbag, Y., Naiman, A., Desiatov, B., & Levy, U. (2015). Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy. In 2015 Conference on Lasers and Electro-Optics, CLEO 2015 Article 7184253 (Conference on Lasers and Electro-Optics Europe - Technical Digest; Vol. 2015-August). Institute of Electrical and Electronics Engineers Inc..

@inproceedings{0e0fe7517aee45aca9d86d03fdea7803,

title = "Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy",

abstract = "We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.",

keywords = "Fiber nonlinear optics, Nanoscale devices, Optical imaging, Optical variables measurement, Optical waveguides, Silicon",

author = "Meir Grajower and Yoel Sebbag and Alex Naiman and Boris Desiatov and Uriel Levy",

note = "Publisher Copyright: {\textcopyright} 2015 OSA.; Conference on Lasers and Electro-Optics, CLEO 2015 ; Conference date: 10-05-2015 Through 15-05-2015",

year = "2015",

month = aug,

day = "10",

language = "אנגלית",

series = "Conference on Lasers and Electro-Optics Europe - Technical Digest",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "2015 Conference on Lasers and Electro-Optics, CLEO 2015",

address = "ארצות הברית",

}

Grajower, M, Sebbag, Y, Naiman, A, Desiatov, B & Levy, U 2015, Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy. in 2015 Conference on Lasers and Electro-Optics, CLEO 2015., 7184253, Conference on Lasers and Electro-Optics Europe - Technical Digest, vol. 2015-August, Institute of Electrical and Electronics Engineers Inc., Conference on Lasers and Electro-Optics, CLEO 2015, San Jose, United States, 10/05/15.

Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy. / Grajower, Meir; Sebbag, Yoel; Naiman, Alex et al.
2015 Conference on Lasers and Electro-Optics, CLEO 2015. Institute of Electrical and Electronics Engineers Inc., 2015. 7184253 (Conference on Lasers and Electro-Optics Europe - Technical Digest; Vol. 2015-August).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy

AU - Grajower, Meir

AU - Sebbag, Yoel

AU - Naiman, Alex

AU - Desiatov, Boris

AU - Levy, Uriel

PY - 2015/8/10

Y1 - 2015/8/10

N2 - We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

AB - We observe for the first time the near field optical intensity distribution of silicon nanophotonic devices operating in the mid-IR spectrum using our scanning thermal microscopy and demonstrate its advantages over conventional NSOM technique.

KW - Fiber nonlinear optics

KW - Nanoscale devices

KW - Optical imaging

KW - Optical variables measurement

KW - Optical waveguides

KW - Silicon

UR - http://www.scopus.com/inward/record.url?scp=84954041385&partnerID=8YFLogxK

M3 - ???researchoutput.researchoutputtypes.contributiontobookanthology.conference???

AN - SCOPUS:84954041385

T3 - Conference on Lasers and Electro-Optics Europe - Technical Digest

BT - 2015 Conference on Lasers and Electro-Optics, CLEO 2015

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - Conference on Lasers and Electro-Optics, CLEO 2015

Y2 - 10 May 2015 through 15 May 2015

ER -

Near field optical measurements of silicon waveguide in mid-IR regime using scanning thermal microscopy

Abstract

Publication series

Conference

Bibliographical note

Keywords

Other files and links

Fingerprint

Cite this