Abstract
In this paper, we present the concept of novel contact-free probe enabling to obtain high accuracy electrical characterizations of interconnection lines within working ULSI microchips. The probe consists of a tapered optical fiber and a certain structure of metallic nanorods (ferromagnetic and nonmagnetic) located within a hole drilled inside the fiber. Using the proposed probe, the waveform of electrical currents is reproduced from the change in the scattering cross section of two interacted metallic nanorods.
| Original language | English |
|---|---|
| Pages (from-to) | 69-74 |
| Number of pages | 6 |
| Journal | Microelectronic Engineering |
| Volume | 104 |
| DOIs | |
| State | Published - 2013 |
Keywords
- Failure analysis
- Interconnects
- Nanoparticles
- Plasmon resonance
- Surface enhanced raman scattering
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