Nano- and micro-scale patterning of Si (1 0 0) under keV ion irradiation

Yashpal S. Katharria; Sandeep Kumar; A. Tarun Sharma; Dinakar Kanjilal

doi:10.1016/j.apsusc.2007.01.130

Nano- and micro-scale patterning of Si (1 0 0) under keV ion irradiation

Yashpal S. Katharria, Sandeep Kumar, A. Tarun Sharma, Dinakar Kanjilal

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Evolution of Si (1 0 0) surface under 100 keV Ar ⁺ ion irradiation at oblique incidence has been studied. The dynamics of surface erosion by ion beam is investigated using detailed analysis of atomic force microscopy (AFM) measurements. During an early stage of sputtering, formation of almost uniformly distributed nano-dots occurs on Si surface. However, the late stage morphology is characterized by self-organization of surface into a regular ripple pattern. Existing theories of ripple formation have been invoked to provide an insight into surface rippling.

Original language	English
Pages (from-to)	6824-6828
Number of pages	5
Journal	Applied Surface Science
Volume	253
Issue number	16
DOIs	https://doi.org/10.1016/j.apsusc.2007.01.130
State	Published - 15 Jun 2007
Externally published	Yes

Keywords

Atomic force microscopy
Nano-dots
Ripples
Sputtering

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10.1016/j.apsusc.2007.01.130

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abstract = " Evolution of Si (1 0 0) surface under 100 keV Ar + ion irradiation at oblique incidence has been studied. The dynamics of surface erosion by ion beam is investigated using detailed analysis of atomic force microscopy (AFM) measurements. During an early stage of sputtering, formation of almost uniformly distributed nano-dots occurs on Si surface. However, the late stage morphology is characterized by self-organization of surface into a regular ripple pattern. Existing theories of ripple formation have been invoked to provide an insight into surface rippling.",

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AU - Katharria, Yashpal S.

AU - Kumar, Sandeep

AU - Tarun Sharma, A.

AU - Kanjilal, Dinakar

PY - 2007/6/15

Y1 - 2007/6/15

N2 - Evolution of Si (1 0 0) surface under 100 keV Ar + ion irradiation at oblique incidence has been studied. The dynamics of surface erosion by ion beam is investigated using detailed analysis of atomic force microscopy (AFM) measurements. During an early stage of sputtering, formation of almost uniformly distributed nano-dots occurs on Si surface. However, the late stage morphology is characterized by self-organization of surface into a regular ripple pattern. Existing theories of ripple formation have been invoked to provide an insight into surface rippling.

AB - Evolution of Si (1 0 0) surface under 100 keV Ar + ion irradiation at oblique incidence has been studied. The dynamics of surface erosion by ion beam is investigated using detailed analysis of atomic force microscopy (AFM) measurements. During an early stage of sputtering, formation of almost uniformly distributed nano-dots occurs on Si surface. However, the late stage morphology is characterized by self-organization of surface into a regular ripple pattern. Existing theories of ripple formation have been invoked to provide an insight into surface rippling.

KW - Atomic force microscopy

KW - Nano-dots

KW - Ripples

KW - Sputtering

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JO - Applied Surface Science

JF - Applied Surface Science

IS - 16

ER -

Nano- and micro-scale patterning of Si (1 0 0) under keV ion irradiation

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Keywords

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