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Molecular dynamics and dynamic Monte Carlo studies of mixed materials and their impact on plasma wall interactions

  • K. Ohya
  • , N. Mohara
  • , K. Inai
  • , A. Ito
  • , H. Nakamura
  • , A. Kirschner
  • , D. Borodin

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

A molecular dynamics technique was used to study the sputtering characteristics of co-deposited carbon (C) and to investigate subsequent effects of introducing beryllium (Be) impurities. Amorphous C layers containing hydrogen (H) with atomic ratios of H/(C+H)<0.3 together with a small amount of Be with ratios of Be/(C+H+Be)<0.06 are produced on top ofa tungsten (W). Noncumulative bombardment of the amorphous C layer without H (i.e., H/(C+H)=0) by H atoms, produces no atomic C sputtering at energies less than the threshold energy for physical sputtering, as calculated by a dynamic Monte Carlo code, EDDY. By examining the H uptake in the layer, it was observed that hydrocarbon sputtering occurs when the dominant emitted species are small radicals e.g. CH and at low H/(C+H) ratios (<0.1). When the ratio was increased, larger radicals (CH2 and CH3) were emitted. In the eV energy range, the larger molecules were the dominant emitted species, whilst C atoms were emitted even at very low energies. A small percentage of Be was implanted in the C layer, and was found to reduce sputtering of the large molecules, whereas the emission of the small molecules and the C atoms was slightly reduced or remained unchanged.

Original languageEnglish
Pages (from-to)1167-1172
Number of pages6
JournalFusion Engineering and Design
Volume85
Issue number7-9
DOIs
StatePublished - Dec 2010
Externally publishedYes

Bibliographical note

Funding Information:
This work was supported by KAKENHI ( 19055005 ).

Funding

This work was supported by KAKENHI ( 19055005 ).

FundersFunder number
Japan Society for the Promotion of Science19055005

    Keywords

    • Co-deposition
    • Material mixing
    • Molecular dynamics simulation
    • Monte Carlo simulation
    • Plasma wall interaction
    • Sputtering

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