Abstract
A molecular dynamics technique was used to study the sputtering characteristics of co-deposited carbon (C) and to investigate subsequent effects of introducing beryllium (Be) impurities. Amorphous C layers containing hydrogen (H) with atomic ratios of H/(C+H)<0.3 together with a small amount of Be with ratios of Be/(C+H+Be)<0.06 are produced on top ofa tungsten (W). Noncumulative bombardment of the amorphous C layer without H (i.e., H/(C+H)=0) by H atoms, produces no atomic C sputtering at energies less than the threshold energy for physical sputtering, as calculated by a dynamic Monte Carlo code, EDDY. By examining the H uptake in the layer, it was observed that hydrocarbon sputtering occurs when the dominant emitted species are small radicals e.g. CH and at low H/(C+H) ratios (<0.1). When the ratio was increased, larger radicals (CH2 and CH3) were emitted. In the eV energy range, the larger molecules were the dominant emitted species, whilst C atoms were emitted even at very low energies. A small percentage of Be was implanted in the C layer, and was found to reduce sputtering of the large molecules, whereas the emission of the small molecules and the C atoms was slightly reduced or remained unchanged.
Original language | English |
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Pages (from-to) | 1167-1172 |
Number of pages | 6 |
Journal | Fusion Engineering and Design |
Volume | 85 |
Issue number | 7-9 |
DOIs | |
State | Published - Dec 2010 |
Externally published | Yes |
Bibliographical note
Funding Information:This work was supported by KAKENHI ( 19055005 ).
Funding
This work was supported by KAKENHI ( 19055005 ).
Funders | Funder number |
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Japan Society for the Promotion of Science | 19055005 |
Keywords
- Co-deposition
- Material mixing
- Molecular dynamics simulation
- Monte Carlo simulation
- Plasma wall interaction
- Sputtering