TY - GEN
T1 - Microstructural investigations of hafnium aluminum oxide films
AU - Craciun, Doina
AU - Socol, Gabriel
AU - Axente, Emanuel
AU - Galca, Aurelian Catalin
AU - Singh, Rajiv
AU - Craciun, Valentin
PY - 2008
Y1 - 2008
N2 - The crystalline structure, composition, chemical bonding and thermal stability of HfO2-Al2O3 mixtures deposited on Si using a combinatorial pulsed laser deposition technique were investigated. After deposition some films were annealed at temperatures from 850 to 950°C for 6 or 12 minutes. Grazing incidence x-ray diffraction investigations were performed to asses the crystallinity and thermal stability of the annealed layers. Measurements of the Al to Hf ratios were performed using energy dispersive x-ray spectroscopy and x-ray photoelectron spectroscopy. From simulations of the x-ray reflectivity and spectroscopic ellipsometry spectra the phase composition and thickness of the films was calculated and then the Al to Hf ratios. Al/Hf values of 1 and 8 were found to be necessary to block the crystallization of the films after anneals at 850 and 950°C, respectively.
AB - The crystalline structure, composition, chemical bonding and thermal stability of HfO2-Al2O3 mixtures deposited on Si using a combinatorial pulsed laser deposition technique were investigated. After deposition some films were annealed at temperatures from 850 to 950°C for 6 or 12 minutes. Grazing incidence x-ray diffraction investigations were performed to asses the crystallinity and thermal stability of the annealed layers. Measurements of the Al to Hf ratios were performed using energy dispersive x-ray spectroscopy and x-ray photoelectron spectroscopy. From simulations of the x-ray reflectivity and spectroscopic ellipsometry spectra the phase composition and thickness of the films was calculated and then the Al to Hf ratios. Al/Hf values of 1 and 8 were found to be necessary to block the crystallization of the films after anneals at 850 and 950°C, respectively.
UR - https://www.scopus.com/pages/publications/70350306520
U2 - 10.1557/proc-1074-i03-18
DO - 10.1557/proc-1074-i03-18
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AN - SCOPUS:70350306520
SN - 9781605608556
T3 - Materials Research Society Symposium Proceedings
SP - 71
EP - 75
BT - Synthesis and Metrology of Nanoscale Oxides and Thin Films
PB - Materials Research Society
T2 - 2008 MRS Spring Meeting
Y2 - 24 March 2008 through 28 March 2008
ER -