Keyphrases
Controlled Microstructure
100%
Ta Films
100%
Tantalum Films
100%
High-resolution Electron Energy Loss Spectroscopy (HREELS)
75%
Temperature Range
50%
Temperature Coefficient of Resistivity
50%
Cu Diffusion
50%
Room Temperature
25%
Annealing
25%
Formation Mechanism
25%
Spectroscopy Studies
25%
Crystalline Structure
25%
Elemental Analysis
25%
Oxygen Content
25%
Pulsed Laser Deposition
25%
Grain Boundary
25%
Non-equilibrium
25%
Diffraction
25%
Electrical Properties
25%
Temperature Value
25%
Microelectronics
25%
Diffusion Distance
25%
Atomic Structure
25%
Optimum Solution
25%
Diffusion Properties
25%
Diffusion Characteristics
25%
High-resolution Electron Microscopy
25%
High Resistivity
25%
Enhanced Diffusion
25%
Ion Mass Spectrometry
25%
Amorphous Structure
25%
Rutherford Backscattering
25%
Disordered Metals
25%
Metallic Behavior
25%
Resistivity Measurement
25%
Property Characteristics
25%
Tantalum
25%
Magnetron Sputtering
25%
Microstructure Structure
25%
Body-centered Cubic Structure
25%
Copper Metallization
25%
Z-contrast Imaging
25%
Scanning Transmission Electron Microscope
25%
Diffusion Barrier Property
25%
Backscatter Measurement
25%
Dispersive Analysis
25%
Beta Tantalum
25%
Cu Metallization
25%
Laser Molecular Beam Epitaxy
25%
Impurity-free
25%
Physics
Polycrystalline
100%
Electron Energy
100%
Grain Boundaries
33%
Backscattering
33%
Electrical Properties
33%
Mass Spectroscopy
33%
Molecular Beam Epitaxy
33%
Electron Microscope
33%
High Resolution
33%
Thin Films
33%
Room Temperature
33%
Electron Microscopy
33%
Magnetron Sputtering
33%
Atomic Structure
33%
Pulsed Laser Deposition
33%
Material Science
Film
100%
Tantalum
100%
Electrical Resistivity
57%
Electron Energy Loss Spectrometry
42%
Amorphous Material
14%
High-Resolution Transmission Electron Microscopy
14%
Elemental Analysis
14%
Silicon
14%
Crystal Structure
14%
Pulsed Laser Deposition
14%
Molecular Beam Epitaxy
14%
Atomic Structure
14%
Magnetron Sputtering
14%
Amorphous Material
14%
Thin Films
14%
Grain Boundary
14%