Matrices pattern using FIB; ‘Out-of-the-box’ way of thinking

Y. Fleger, K. Gotlib-Vainshtein, Y. Talyosef

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high-resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an ‘out-of-the-box’ method of writing using FIB, which enables creating very large matrices, up to the beam-shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.

Original languageEnglish
Pages (from-to)307-312
Number of pages6
JournalJournal of Microscopy
Volume265
Issue number3
DOIs
StatePublished - 1 Mar 2017

Bibliographical note

Publisher Copyright:
© 2017 The Authors Journal of Microscopy © 2017 Royal Microscopical Society

Keywords

  • FIB
  • He ion beam microscopy
  • nanopatterning

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