Abstract
Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high-resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an ‘out-of-the-box’ method of writing using FIB, which enables creating very large matrices, up to the beam-shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.
Original language | English |
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Pages (from-to) | 307-312 |
Number of pages | 6 |
Journal | Journal of Microscopy |
Volume | 265 |
Issue number | 3 |
DOIs | |
State | Published - 1 Mar 2017 |
Bibliographical note
Publisher Copyright:© 2017 The Authors Journal of Microscopy © 2017 Royal Microscopical Society
Funding
We gratefully acknowledge the support provided by the INNI and ISF to the Institute of Nanotechnology and Advanced materials at Bar-Ilan University for this work.
Funders | Funder number |
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INNI | |
Israel Science Foundation |
Keywords
- FIB
- He ion beam microscopy
- nanopatterning